Laboratory Resources

Growth and Epitaxy

• Metal-Organic Chemical Vapor Deposition (MOCVD)
• Molecular Beam Epitaxy (MBE)
• Low Pressure Chemical Vapor Deposition (LPCVD)
• Beta SiC Bulk Crystal Growth System

Characterization

• Secondary Ion Mass Spectroscopy (SIMS)
• Auger Spectroscopy
• Deep Level Transient Spectroscopy
• Photoluminescence
• Scanning Electron Microscope (SEM)
• Ion Milling

Fabrication

• Kal Suss mask aligner
• 300 kV Ion Implantor
• E-Beam and Thermal Evaporation
• Barrel Plasma Etcher
• Heatpulses 410 Rapid Thermal Processor
• Plasma Therm In-Line Wafer Plasma Etcher (expecting to be in-operation in Fall 1995)

Testing

• Hall Measurement
• Polaron Electrochemical Profiler
• AI REL-2000 probe station
• HP4145B Semiconductor Parameter Analyzer
• HP4192A LF Impedance Analyzer

Laser laboratory

• Mode Locked Nd:YAG Laser and two dye lasers
• Spectrophotometer
• Cavity Dumpers
• Cathodoluminescence
• Excimer Lasers
• Tunable IR Diode Laser Spectrometer

Computer Aided Design

• Magic
• LASI pro 5.0
• Spice3
• Design Center 6.0